Technologies

Plasma Enhanced Chemical Vapor Deposition:

Plasma enhanced chemical vapor deposition (PECVD) technology has been widely used for synthetic diamond and diamond-like material growth. Polycrystalline and monocrystalline diamond, as well as diamond-like carbon (DLC), can be deposited by PECVD with high-quality and fast growth rate. The microwave PECVD reactor in VOLI is capable of growing optical quality polycrystalline diamond discs with a diameter of up to 3 inches. The special designed stage (substrate holder) allows seamless transition between thermal-floating biasing deposition configuration and water-cooled high growth-rate deposition configuration.

Adhesive-Free Bond (AFB®):

Adhesive-Free Bond (AFB®) technology is an ideal method of bonding two inhomogeneous crystals. In the case of thermal management, since the AFB® bonding can release the stress due to coefficient of thermal expansion (CTE) mismatch between the two bonded materials, this bond can sustain severe thermal cycling, which other two-fold material systems with a high CTE mismatch would not survive. For more information about AFB® technology, please click here.

Laser Cutting of Diamond:

The laser cutting system in VOLI consists of a high power green laser (Quantronix, 10 Watts power and 532nm wavelength), an optical beam focusing system, and a computer controlled motorized 2-D motion stage. This system cuts and patterns diamond wafers and other materials with small kerf width and good surface finish.